Lateral length scales of latent image roughness as determined by off-specular neutron reflectivity

Abstract

A combination of specular and off-specular neutron reflectometries was used to measure the buried lateral roughness of the reaction-diffusion front in a model extreme ultraviolet lithography photoresist. Compositional heterogeneities at the latent reaction-diffusion front has been proposed as a major cause of line edge roughness in photolithographic features. This work describes the experimental observation of the longitudinal and lateral compositional heterogeneities of a latent image, revealing the buried lateral length scale as well as the amplitude of inhomogeneity at the reaction-diffusion front. These measurements aid in determining the origins of line edge roughness formation, while exploring the material limits of the current chemically amplified photoresists.