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Accurate dependence of gallium nitride thermal conductivity on dislocation density
216
Citations
18
References
2006
Year
Materials ScienceDislocation DensitiesAccurate DependenceWide-bandgap SemiconductorEngineeringDislocation InteractionCrystalline DefectsApplied PhysicsCondensed Matter PhysicsAluminum Gallium NitrideGan Power DeviceGallium OxideDislocation DensityThermal Conductivity
The authors experimentally find that the thermal conductivity of gallium nitride depends critically on dislocation density using the 3-omega technique. For GaN with dislocation densities lower than 106cm−2, the thermal conductivity is independent with dislocation density. The thermal conductivity decreases with a logarithmic dependence for material with dislocation densities in the range of 107–1010cm−2. These results are in agreement with theoretical predictions. This study indicates that the hydride vapor phase epitaxy method offers an attractive route for the formation of semi-insulating gallium nitride with optimal thermal conductivity values around 230W∕mK and very low dislocation density near 5×104cm−2.
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