Characterization of masking layers for deep wet etching of glass in an improved HF/HCl solution - Concepedia

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Characterization of masking layers for deep wet etching of glass in an improved HF/HCl solution

184

Citations

9

References

2004

Year

Ciprian Iliescu, Jing Ji, Francis E. H. Tay, Jianmin Miao, Tietun Sun

Surface and Coatings Technology

Materials ScienceChemical EngineeringEngineeringMicrofabricationSurface ScienceImproved Hf/hcl SolutionDeep Wet EtchingPlasma EtchingSurface Processing

References

	Year	Citations

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