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High growth rate process in a SiC horizontal CVD reactor using HCl
Francesco La Via,
G. Galvagno,
Fabrizio Roccaforte,
Filippo Giannazzo,
Salvatore Di Franco,
Alfonso Ruggiero,
R. Reitano,
L. Calcagno,
G. Fóti,
Marco Mauceri,
Microelectronic EngineeringElectrical EngineeringEngineeringFusion Reactor Material