Publication | Closed Access
Ultrahigh Responsivity Visible and Infrared Detection Using Silicon Nanowire Phototransistors
151
Citations
20
References
2010
Year
Photonic SensorEngineeringOptoelectronic DevicesPhotoelectric SensorBeam LithographyPhotodetectorsNanoelectronicsNanowire GeometryNanometrologyNanosensorNanolithography MethodPhotonicsElectrical EngineeringNanotechnologyUltrahigh Responsivity VisiblePhotoelectric MeasurementNanowire PhotodetectorsOptical SensorsOptoelectronicsNanoimprint LithographyInfrared SensorApplied PhysicsNanofabricationOptical Sensor
Nanowire photodetectors can perform exceptionally well due to their unique properties arising from the nanowire geometry. Here we report on the phenomenal responsivity and extended spectral range of scalable, vertically etched, silicon nanowire photodetector arrays defined by nanoimprint lithography. The high internal gain in these devices allows for detection at below room temperatures of subfemtowatt per micrometer visible illumination and picowatt infrared illumination resulting from band to surface state generation.
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