Publication | Closed Access
Ultrafast x-ray measurement of laser heating in semiconductors: Parameters determining the melting threshold
69
Citations
26
References
2001
Year
EngineeringLaser AblationLaser HeatingDifferent SemiconductorsAuger HeatingOptical PropertiesMelting ThresholdX-ray MeasurementPulsed Laser DepositionUltrafast LasersMaterials SciencePhysicsLaser Processing TechnologyX-ray Free-electron LaserAblation ThresholdsLaser-induced BreakdownApplied PhysicsUltrafast OpticsOptoelectronicsLaser Damage
The pulse-width dependence of thermal melting and ablation thresholds in germanium and gallium arsenide is correlated to direct, ultrafast x-ray measurements of laser-heated depths. The heating dynamics, determined by the interplay of nonlinear optical absorption, delayed Auger heating, and high-density carrier diffusion, explain the scaling laws of thermal melting thresholds in different semiconductors.
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