Technical Physics · 2012 · 16 citations · 5 references
Natural SciencesMaterials EngineeringMaterials SciencePlasma PhysicsSurface ScienceThin FilmsMagnetic OxidesMetal OxidesSurface OxidationThin-film DepositionMagnetron SputteringOxide Film FormationOxide Growth KineticsOxide Layer FormationThin Oxide FilmsThin-film Oxides
A discharge in a planar magnetron with a titanium target is studied. It is found that a pressure rise from 2 to 6 mTorr in argon at a constant current increases the intensity of excited argon ion lines by almost 20%. The excitation of neutral titanium atoms is independent of the argon pressure: it depends on only the discharge current. The current-voltage characteristic of the magnetron in an argon-oxygen mixture completely reflects processes proceeding on the target of the magnetron.
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Nonisothermal chemical model of reactive sputtering
A. A. Barybin · Journal of Applied Physics · 2007 · 38 citations