Publication | Open Access
Electron-beam-induced strain within InGaN quantum wells: False indium “cluster” detection in the transmission electron microscope
259
Citations
10
References
2003
Year
SemiconductorsMaterials ScienceEngineeringElectron MicroscopyPhysicsMicroscopyCrystalline DefectsElectron BeamOptoelectronic MaterialsApplied PhysicsIngan Quantum WellsSemiconductor NanostructuresMicroanalysisElectron-beam-induced StrainElectron MicroscopeElectron DiffractionIndium Content
InGaN quantum wells have been found to be extremely sensitive to exposure to the electron beam in the transmission electron microscope (TEM). High-resolution TEM images acquired immediately after first irradiating a region of quantum well indicates no gross fluctuations of indium content in the InGaN alloy. During only a brief period of irradiation, inhomogeneous strain is introduced in the material due to electron beam damage. This strain is very similar to that expected from genuine nanometer-scale indium composition fluctuations which suggests there is the possibility of falsely detecting indium-rich “clusters” in a homogeneous quantum well.
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