Publication | Open Access
Design and fabrication of binary slanted surface-relief gratings for a planar optical interconnection
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Citations
17
References
1997
Year
Optical MaterialsEngineeringElectron-beam LithographyOptic DesignBeam LithographyOptical PropertiesPhotonic Integrated CircuitOptical SystemsPlanar Waveguide SensorNanophotonicsPhotonicsGratingsParametric OptimizationFreeform OpticSurface-relief GratingsUniform Intensity DistributionMicroelectronicsApplied PhysicsPlanar Optical InterconnectionOptoelectronicsDiffractive Optic
We propose the use of binary slanted surface-relief gratings with parallel-groove walls as input and output couplers in a planar optical interconnect. Parametric optimization of cascaded output couplers is employed to design an interconnect consisting of N output couplers producing a uniform intensity distribution with a high efficiency that may be realized in one lithographic etching step. The sensitivity of a N = 4 interconnect to various fabrication errors is analyzed. We demonstrate the operation of a slanted surface-relief grating manufactured with electron-beam lithography and reactive-ion etching for an operating wavelength of lambda = 0.633 mum.
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