Publication | Closed Access
Noise Measurements of Discrete HEMT Transistors and Application to Wideband Very Low-Noise Amplifiers
59
Citations
25
References
2013
Year
Gaas LnaElectrical EngineeringEngineeringGaas HemtsRf SemiconductorHigh-frequency DeviceElectronic EngineeringMixed-signal Integrated CircuitApplied PhysicsNoise MeasurementsNoiseInp LnaDiscrete Hemt TransistorsMicroelectronicsLow-noise AmplifiersNoise ReductionSemiconductor Device
The noise models of InP and GaAs HEMTs are compared with measurements at both 300 and 20 K. The critical parameter, Tdrain, in the Pospieszalski noise model is determined as a function of drain current by measurements of the 1-GHz noise of discrete transistors with 50- Ω generator impedance. The dc I-V for the transistors under test are presented and effects of impact-ionization are noted. InP devices with both 100% and 75% indium mole fraction in channel are included. Examples of the design and measurement of very wideband low-noise amplifiers (LNAs) using the tested transistors are presented. At 20-K physical temperature the GaAs LNA achieves 10-K noise over the 0.7-16-GHz range with 16 mW of power and an InP LNA measures 20-K noise over the 6-50-GHz range with 30 mW of power.
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