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Sputter depth profiling of Mo/B4C/Si and Mo/Si multilayer nanostructures: A round-robin characterization by different techniques

Materials ScienceMaterials EngineeringEngineeringPhysicsSputter Depth ProfilingNanoelectronicsSurface ScienceApplied PhysicsMo/si Multilayer NanostructuresSemiconductor Device FabricationThin Film Process TechnologySilicon On InsulatorMicroelectronicsRound-robin CharacterizationThin Film ProcessingSemiconductor Nanostructures