Publication | Closed Access
Molecular-beam epitaxy of beryllium-chalcogenide-based thin films and quantum-well structures
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Citations
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References
1996
Year
EngineeringBete Buffer LayersOptoelectronic DevicesType IiSemiconductor NanostructuresSemiconductorsIi-vi SemiconductorElectronic DevicesMolecular-beam EpitaxyQuantum MaterialsBete–znse PseudogradingMolecular Beam EpitaxyEpitaxial GrowthCompound SemiconductorMaterials ScienceOptoelectronic MaterialsSemiconductor MaterialElectronic MaterialsApplied PhysicsThin Films
A variety of BeMgZnSe–ZnSe- as well as BeTe-based quantum-well structures has been fabri- cated and investigated. BeTe buffer layers improve the growth start on GaAs substrates drasti- cally compared to ZnSe/GaAs. The valence-band offset between BeTe and ZnSe has been determined to be 0.9 eV (type II). Due to the high-lying valence band of BeTe, a BeTe–ZnSe pseudograding can be used for an efficient electrical contact between p-ZnSe and p-GaAs. BeMgZnSe quaternary thin-film structures have reproducibly been grown with high struc- tural quality, and rocking curve widths below 20 arcsec could be reached. Quantum-well structures show a high photoluminescence intensity even at room temperature.
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