Publication | Closed Access
Atomic layer growth of SiO2 on Si(100) using SiCl4 and H2O in a binary reaction sequence
137
Citations
69
References
1995
Year
Materials EngineeringMaterials ScienceEngineeringBinary Reaction SequenceSurface ScienceApplied PhysicsSiliceneSemiconductor Device FabricationSilicon On InsulatorEpitaxial GrowthAtomic Layer GrowthChemical Vapor Deposition
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