Plasma-oxidation of Ge(100) surfaces using dielectric barrier discharge investigated by metastable induced electron spectroscopy, ultraviolet photoelectron spectroscopy, and x-ray photoelectron spectroscopy

Abstract

The radical oxidation of Ge(100) applying a dielectric barrier discharge plasma was investigated using metastable induced electron spectroscopy, ultraviolet photoelectron spectroscopy, and x-ray photoelectron spectroscopy. The plasma treatments were performed in a pure oxygen atmosphere as well as under environmental conditions at room temperature. In both atmospheres GeO2 layers up to thicknesses of several nm were formed on the Ge(100) surface.