Publication | Closed Access
Temperature and Epi Thickness Dependence of the Heavy Ion Induced Latchup Threshold for a CMOS/EPI 16K Static RAM
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Citations
6
References
1987
Year
Non-volatile MemoryElectrical EngineeringXenon IonsCmos/epi 16KVlsi DesignEpi Thickness DependenceEngineeringEmerging Memory TechnologyBias Temperature InstabilityApplied PhysicsComputer EngineeringVs. TemperatureSemiconductor MemoryMicroelectronicsBeyond CmosStatic Ram
Data have been obtained with krypton and xenon ions for the latchup threshold vs. temperature of four different versions of a Harris CMOS/epi 16K static RAM. These special versions of the HM6516 RAM have 12-micron, 9-micron, 7-micron and 5-micron epi thicknesses, as grown. The test data showed a marked improvement in latchup resistance with decreasing epi thickness and with decreasing temperature over the range of 25°C (operating chip ambient) to 100°C.
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