Thermal Analysis of Positive Photoresist Films by Mass Spectrometry

Abstract

Mass spectrometry is used to monitor the effect of temperature on positive photoresist and its two major components, a base resin and a photoactive compound. This technique is also used to identify the photolytic products of photoresist by exposing it in situ to ultraviolet radiation and to identify the resulting volatile products when it is heated after exposure. Quantitative data are obtained for the two major thermal products of photoresist, and the activation energy is calculated for the thermal degradation of the photoactive compound.