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Lateral diffusion of minority carriers in InAsSb-based nBn detectors
43
Citations
13
References
2010
Year
Wide-bandgap SemiconductorElectrical EngineeringEngineeringPhysicsInfrared SensorBarrier LayerApplied PhysicsMinority CarriersNbn DesignCategoryiii-v SemiconductorOptoelectronicsCompound Semiconductor
We report on the investigation of lateral diffusion of minority carriers in InAsSb based photodetectors with the nBn design. Diffusion lengths (DLs) were extracted from temperature dependent I-V measurements. The behavior of DL as a function of applied bias, temperature, and composition of the barrier layer was investigated. The obtained results suggest that lateral diffusion of minority carriers is not the limiting factor for InAsSb based nBn mid-wave infrared detector performance at high temperatures (>200 K). The detector with an As mole fraction of 10% in the barrier layer has demonstrated values of DL as low as 7 μm (Vb=0.05 V) at 240 K.
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