Development of UHV dynamic nanostencil for surface patterning

Abstract

A dynamic nanostencil system based on a movable atomic force microscopy (AFM) cantilever-borne mask has been developed in ultrahigh vacuum environment. This system is conceived to offer an outstanding nanopatterning capability of nanometer precision as well as in situ AFM characterization with a large scanning range. Evaporation experiments in both static and dynamic mode have been performed successfully on this system, and some crucial technical problems of stencilling technique such as resolution and clogging are investigated. As an important application of molecular electronics, a method to fabricate and connect nanoscale structures with microelectrodes by accurately combining it with static stenciling is presented.