Journal of Applied Physics · 1991 · 71 citations · 14 references
Natural SciencesMaterials EngineeringMaterials ScienceMaterials CharacterizationSemiconductor MaterialsThin FilmsEpitaxial GrowthOxide SemiconductorsSemiconductor Crystal GrowthSemiconductor Device MaterialsSpray DepositionThin Film Surface MorphologyCarrier ConcentrationFilm Growth MechanismsGrazing-incidence X-ray DiffractionGrowth MechanismsHall EffectHall Effect MeasurementsThin-film Growth KineticsThin-film Growth Mechanisms
In order to probe into the growth mechanism of sprayed SnO2 films, the films were deposited with different Sn concentrations in the precursor solution. The orientational properties were determined using grazing incidence x-ray diffraction. The preferred growth changed from [110] to [200] direction as the Sn incorporation was increased. Such a change in growth can be anticipated from structure factor calculations. The compositional analysis was done using x-ray photoelectron spectroscopy. The Hall effect measurements indicated that the carrier concentration and mobility are sensitively dependent on the orientation and composition of the films.
14
Transparent conductors—A status review
K. L. Chopra, S.S. Major, Dinesh K. Pandya · Thin Solid Films · 1983 · 2.7K citations
Natural Sciences, Electrical Engineering, Materials Science +14
Optical and electrical properties of doped In2O3 films
H. Köstlin, R. Jost, W. Lems · physica status solidi (a) · 1975 · 289 citations