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Modulated molecular-beam studies of the surface chemistry of silicon reaction with reactive gases
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1987
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Reactive GasesChemical KineticsEngineeringSilicon ReactionMass-spectrometric DetectionChemistrySilicon On InsulatorMolecular BeamsMaterials ScienceNanotechnologyPhysical ChemistryHydrogenSurface CharacterizationSurface ChemistrySurface AnalysisSurface ScienceApplied PhysicsGas–solid Surface ReactionsMolecular-beam StudiesSurface Reactivity
The method of studying the kinetics of gas–solid surface reactions using modulated molecular beams and mass-spectrometric detection is described. Results obtained for Si(111) etching by H(g) and deposition from SiH4 are presented.