Influence of Thermal Oxidation Temperatures on the Structural and Morphological Properties of MoO<sub>3</sub>Thin Films

Alireza Hojabri, Fatemeh Hajakbari, Ali Emami Meibodi, M. A. Moghri Moazzen

Acta Physica Polonica A · 2013 · 12 citations · 4 references

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Abstract

In this study, molybdenum (Mo) thin lms have been deposited on Si substrate by dc magnetron sputtering. Then for preparation of MoO3 thin lms the thermal oxidation of Mo thin lms under the oxygen ow was employed in the electrical furnace. The inuence of the dierent thermal oxidation temperatures at 400, 600, 800 and 1000 C on the structural and morphological properties of MoO3 thin lms were characterized by X-ray diraction and atomic force microscopy, respectively. The results show that the crystallinity and surface morphology of the lms are strongly dependent on the thermal oxidation temperatures.

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