Atmospheric Pressure Glow Discharge CVD of Al₂O₃ Thin Films

Abstract

Abstract Summary: We report for the first time deposition of aluminium oxide thin films by APGD, plasma‐enhanced CVD. This approach allows deposition at substantially lower substrate temperatures than normally used in atmospheric pressure based processing. The films are analysed by SEM, XPS, RBS, XRD, and optical properties. It is demonstrated that the APGD approach yields films which are essentially smooth, conformal and free from pinholes or other imperfections. SEM image of alumina film on glass (film G). magnified image SEM image of alumina film on glass (film G).