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Oxide‐Substrate and Oxide‐Oxide Chemical Reactions in Thermally Annealed Anodic Films on GaSb , GaAs , and GaP
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1980
Year
Materials ScienceSemiconductorsTernary Phase DiagramsMaterial AnalysisEngineeringElectronic MaterialsOxide ElectronicsSurface ScienceApplied PhysicsFundamental PatternOxide‐oxide Chemical ReactionsGallium OxideSemiconductor MaterialThin Film Process TechnologyChemistryThin FilmsOxide‐oxide ReactionsThin Film Processing
A fundamental pattern of oxide‐substrate reactions has been identified in thermally annealed anodic films on and through the use of Raman scattering and ternary phase diagrams. The relevant reactions on and yield interfacial deposits of As and Sb via and . The failure to observe elemental P generation in annealed anodic films on in conjunction with an estimate of the Ga‐P‐O phase diagram suggests that oxide‐oxide reactions occur in the film instead. Formation of either ortho or metaphosphate will depend on the ratio in the film according to and .