Review on Atomic Layer Deposition and Applications of Oxide Thin Films

Abstract

Atomic layer deposition technique is able to grow conformal thin films over high aspect ratio structures. This article reviews the various aspects of oxides grown by this method including applications in photovoltaics and memristors. The main focus of this review is to concentrate on the oxides grown by atomic layer deposition and their growth mechanisms. The oxides deposited using atomic layer deposition are also likely to find application in memristor, an emerging field in the non volatile memories design with the ability to retain data and memory states even in power-off condition. The use of this technique to obtain oxides in surface modification of nanostructures gives the significance of these materials.