Publication | Closed Access
Mechanism for rapid thermal annealing improvements in undoped GaNxAs1−x/GaAs structures grown by molecular beam epitaxy
100
Citations
13
References
2000
Year
Wide-bandgap SemiconductorOptical MaterialsEngineeringOptoelectronic DevicesSemiconductorsOptical PropertiesUndoped Ganxas1−x/gaas StructuresMolecular Beam EpitaxyCompound SemiconductorMaterials SciencePhysicsCrystalline DefectsOptoelectronic MaterialsCategoryiii-v SemiconductorUndoped Ganas/gaas StructuresApplied PhysicsRapid Thermal AnnealingGan Power DeviceOptoelectronicsComposition Uniformity
A systematic investigation of the effect of rapid thermal annealing (RTA) on optical properties of undoped GaNAs/GaAs structures is reported. Two effects are suggested to account for the observed dramatic improvement in the quality of the GaNxAs1−x/GaAs quantum structures after RTA: (i) improved composition uniformity of the GaNxAs1−x alloy, deduced from the photoluminescence (PL), PL excitation and time-resolved measurements; and (ii) significant reduction in the concentration of competing nonradiative defects, revealed by the optically detected magnetic resonance studies.
| Year | Citations | |
|---|---|---|
Page 1
Page 1