Publication | Closed Access
A photoluminescence comparison of CdTe thin films grown by molecular-beam epitaxy, metalorganic chemical vapor deposition, and sputtering in ultrahigh vacuum
44
Citations
23
References
1988
Year
Optical MaterialsEngineeringUltrahigh VacuumPhotoluminescence ComparisonSemiconductor NanostructuresSemiconductorsSharp Exciton TransitionsIi-vi SemiconductorObserved ImpurityMolecular Beam EpitaxyCompound SemiconductorThin Film ProcessingMaterials SciencePhotoluminescenceCrystalline DefectsNanotechnologyOptoelectronic MaterialsCdte Thin FilmsExciton LinesApplied PhysicsThin FilmsOptoelectronicsChemical Vapor DepositionSolar Cell Materials
High perfection CdTe thin films have been grown on (001) InSb and CdTe substrates by molecular-beam epitaxy, metalorganic chemical vapor deposition (MOCVD), and sputtering in ultrahigh vacuum techniques. The quality of the as-grown CdTe films are characterized by 2-K photoluminescence. The spectra show strong and sharp exciton transitions and weak 1.40–1.50-eV defect-related bands. Radiative defect densities of lower than 0.002 are realized. High-resolution spectroscopy shows that the full width at half maximum of the principal bound exciton lines is about 0.1 meV. Such small ρ values and narrow photoluminescence lines have not been previously reported. The largest luminescence efficiency is observed for MOCVD-CdTe films grown on CdTe substrates. A variety of impurities appear to be responsible for the observed radiative transitions in these three kinds of CdTe films. We attempt to assign the observed impurity related lines by a comparison with ‘‘known’’ impurities in bulk CdTe spectra given in the literature.
| Year | Citations | |
|---|---|---|
Page 1
Page 1