Microfabrication of millimeter wave vacuum electron devices by two-step deep-etch x-ray lithography

Abstract

The circuits for millimeter wave vacuum electron devices with all circuit elements including an electron beam tunnel are microfabricated by two-step deep-etch x-ray lithography (x-ray LIGA). The discrepancies of eigenfrequency between experiment and simulation are within 1.1% in a coupled-cavity structure and 1.4% in a folded waveguide structure when the operating frequency is about 100GHz. Furthermore, a measured tolerance of below 2μm, and a measured surface roughness of 20–70nm, of LIGA-fabricated circuits implies the two-step LIGA microfabrication has potential applications up to the submillimeter wave region.