Elastic stiffness and thermal expansion coefficients of various refractory silicides and silicon nitride films

Calculated elastic constants for stress problems associated with semiconductor devices

William A. Brantley · Journal of Applied Physics · 1973 · 1.2K citations

Natural Sciences, Materials Engineering, Materials Science +17

First phase nucleation in silicon–transition-metal planar interfaces

R. M. Walser, R. W. Bené · Applied Physics Letters · 1976 · 503 citations

Natural Sciences, Materials Engineering, Materials Science +17

Elastic constants of synthetic single crystal corundum at room temperature

J.B. Wachtman, Wayne E. Tefft, D. G. Lam et al. · Journal of Research of the National Bureau of Standards Section A Physics and Chemistry · 1960 · 289 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +11

Thermal stresses and cracking resistance of dielectric films (SiN, Si3N4, and SiO2) on Si substrates

A. K. Sinha, H. J. Levinstein, T. E. Smith · Journal of Applied Physics · 1978 · 269 citations

Engineering, Materials Engineering, Materials Science +17

Linear Thermal Expansion of Aluminum Oxide and Thorium Oxide from 100° to 1100°K

J.B. Wachtman, T. G. Scuderi, G. W. Cleek · Journal of the American Ceramic Society · 1962 · 205 citations

Natural Sciences, Materials Engineering, Materials Science +16