Magnetic patterning using ion irradiation for highly ordered CoPt alloys with perpendicular anisotropy

Abstract

We used a combination of ion irradiation and e-beam lithography to magnetically pattern an ordered CoPt alloy with strong perpendicular magnetic anisotropy. Ion irradiation disorders the alloy and strongly reduces the magnetic anisotropy. Magnetic force microscopy showed a regular array of 1μm2 square dots with perpendicular anisotropy separated by 1 μm large ranges with in-plane anisotropy. This is further confirmed by magnetic measurements, which showed that arrays protected by a 200 nm Pt layer present the same coercive field and the same perpendicular anisotropy as before irradiation. This is promising for applications in magnetic recording technologies.