Computer-controlled electron-beam writing system for thin film micro-optics

Abstract

A computer-controlled electron-beam writing system has been developed. The system has various functions for fabricating thin film micro-optical devices. The ability of 0.1-μm patterning, smooth circular and elliptic scanning of an electron beam, and excellent blazing characteristics have been demonstrated. The system has been confirmed to be an efficient means for fabricating micro-optical devices.