Applied Physics Letters · 1987 · 253 citations · 9 references
Natural SciencesMaterials EngineeringMaterials ScienceMechanical Behavior Of MaterialsMicrofabricationThin FilmsResidual StressStrain MeasurementStress-strain BehaviorThin Film Mechanical PropertiesThin Film StrainThin-film MaterialsIn Situ MeasurementMechanical Properties Of FilmsMembrane Mechanical PropertiesResidual Stress In Thin FilmsSilicon DioxideStress MeasurementThin Film MechanicsYoung's Modulus
Two microfabricated structures for the in situ measurement of mechanical properties of thin films, a suspended membrane, and an asymmetric ‘‘released structure,’’ are reported. For a polyimide film on silicon dioxide, the membrane measurements yield a residual tensile stress of 30 MPa and a Young’s modulus of 3 GPa. The released structures measure the ratio of residual stress to Young’s modulus, and yield 0.011 at strains comparable to the suspended membranes, and 0.015 at larger strains. The ultimate strain as measured by both structures is approximately 4%.
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Structure and Properties of Thin Films
C. A. Neugebauer, J. B. Newkirk, D. A. Vermilyea et al. · Journal of The Electrochemical Society · 1962 · 525 citations