Publication | Closed Access
Metal organic vapour phase epitaxy of GaN and lateral overgrowth
304
Citations
203
References
2004
Year
Wide-bandgap SemiconductorEngineeringHigh Decomposition PressureChemistryWide-bandgap SemiconductorsPower SemiconductorsMolecular Beam EpitaxyGallium NitrideMaterials ScienceMaterials EngineeringElectrical EngineeringOptoelectronic MaterialsAluminum Gallium NitrideGallium OxideCategoryiii-v SemiconductorLateral OvergrowthSurface ScienceApplied PhysicsGan Power DeviceHigh TemperatureOptoelectronics
Gallium nitride (GaN) is an extremely promising wide band gap semiconductor material for optoelectronics and high temperature, high power electronics. Actually, GaN is probably the most important semiconductor since silicon. However, achievement of its full potential has still been limited by a dramatic lack of suitable GaN bulk single crystals. GaN has a high melting temperature and a very high decomposition pressure; therefore it cannot be grown using conventional methods used for GaAs or Si like Czochraslski or Bridgman growths.
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