Fabrication of quasiperiodic nanostructures with EUV interference lithography

Abstract

We demonstrate the fabrication and analysis of well-ordered high-resolution quasiperiodic nanostructures with feature sizes down to a few tens of nanometers using extreme ultraviolet interference lithography. A well-controlled mask manufacturing process for producing high quality transmission diffraction masks enables simple and fast fabrication of highly ordered 2D quasiperiodic structures using 5- and 8-beam interference setups.