Applied Physics Letters · 2000 · 48 citations · 9 references
Si SubstrateOptical MaterialsX-ray SpectroscopyEngineeringMultilayer MirrorSynchrotron Radiation SourceElectron OpticX-ray ImagingOptical PropertiesX-ray TechnologyRelativistic ElectronsMev ElectronsRadiation ImagingHealth SciencesPhotonicsPhysicsAtomic PhysicsCosmic RayX-ray Free-electron LaserX-ray Multilayer MirrorApplied PhysicsOptoelectronicsX-ray Optic
We have observed the emission of 15 keV x rays produced by 500 MeV electrons passing through a x-ray multilayer mirror. The mirror consisted of 300 pairs of W and B4C layers with layer spacing of 12.36 Å and supported by a 100 μm Si substrate. The x rays were emitted at the Bragg angle θγ=33.15 mrad with respect to the mirror surface and at the angle θD=66.3 mrad with respect to the electron-beam direction. The spatial distribution and the spectral angular dependence of the x rays were measured and shown to be larger than the parametric x rays emitted from the Si substrate. The value of the differential photon efficiency was estimated to be about 0.22 photons/electron/str.
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