Layered synthetic microstructures as Bragg diffractors for X rays and extreme ultraviolet: theory and predicted performance

TLDR

Recent advances in thin‑film technology enable multilayered thin‑film structures—layered synthetic microstructures (LSMs)—to function as efficient Bragg diffractors for X‑ray and EUV radiation, offering broad potential applications in X‑ray/EUV instrumentation. The paper applies X‑ray diffraction theory to LSMs and presents approximate formulas for estimating their performance. The authors describe a complete computation scheme based on optical multilayer theory that shows how adjusting layer refractive indices and thicknesses tailors diffracting properties to specific applications. The study demonstrates how the theory can be modified to account for structural imperfections and to compute properties of nonperiodic LSMs.

Abstract

Recent developments in thin film technology have made possible the construction of multilayered thin film structures that act as efficient Bragg diffractors for x rays and extreme ultraviolet (EUV) radiation. These structures (which we term layered synthetic microstructures or LSMs) are analogous to multilayer interference filters for the visible spectral region and have important potential applications in many areas of x-ray/EUV instrumentation. In this paper the theory of x-ray diffraction by periodic structures is applied to LSMs, and approximate formulas for estimating their performance are presented. A more complete computation scheme based on optical multilayer theory is described, and it is shown that, by adjusting the refractive indices and thicknesses of the component layers, the diffracting properties may be tailored to specific applications. Finally, it is shown how the theory may be modified to take account of imperfections in the LSM structure and to compute the properties of nonperiodic structures.