Influence of manufacturing process of indium tin oxide sputtering targets on sputtering behavior

Highly Conductive and Transparent Aluminum Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering

Tadatsugu Minami, Hidehito Nanto, Shinzo Takata · Japanese Journal of Applied Physics · 1984 · 548 citations

Natural Sciences, Materials Engineering, Materials Science +17

Highly Conductive, Transparent Films of Sputtered In[sub 2−x]Sn[sub x]O[sub 3−y]

David B. Fraser, H. D. Cook · Journal of The Electrochemical Society · 1972 · 319 citations

Natural Sciences, Materials Engineering, Materials Science +17

Low resistivity indium–tin oxide transparent conductive films. II. Effect of sputtering voltage on electrical property of films

S. Ishibashi, Yoshiyuki Higuchi, Yukihide Ota et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1990 · 275 citations

Natural Sciences, Electrical Engineering, Materials Science +17

Indium tin oxide thin films prepared by chemical vapour deposition

Toshiro Maruyama, Kunihiro Fukui · Thin Solid Films · 1991 · 126 citations

Natural Sciences, Materials Engineering, Materials Science +16

High Conducting Large Area Indium Tin Oxide Electrodes for Displays Prepared by DC Magnetron Sputtering

R. Latz, K. Michael K. Michael, M. Scherer M. Scherer · Japanese Journal of Applied Physics · 1991 · 106 citations

Natural Sciences, Materials Engineering, Materials Science +17