M Weigert

Influence of manufacturing process of indium tin oxide sputtering targets on sputtering behavior

B.L. Gehman, S. K. M. Jönsson, Tobias Rudolph et al. · Thin Solid Films · 1992 · 91 citations

Natural Sciences, Materials Engineering, Materials Science +7

Application of the glow discharge mass spectrometry (GDMS) for the multi-element trace and ultratrace analysis of sputtering targets

Cornel Venzago, M Weigert · Analytical and Bioanalytical Chemistry · 1994 · 40 citations

Pharmacy, Chemistry, Materials Science +16

Isochronal recovery and damage rate measurements in dilute NiSi alloys

A. Bartels, F. Dworschak, M Weigert · Journal of Nuclear Materials · 1986 · 22 citations

Natural Sciences, Materials Engineering, Materials Science +5

Juventude e pobreza: a construção de sujeitos potencialmente perigosos

Andréa Cristina Coelho Scisleski, Carolina dos Reis, Oriana Holsbach Hadler et al. · DOAJ (DOAJ: Directory of Open Access Journals) · 2012 · 14 citations · Full text

Social Sciences, Sociology, Communication Theory +5

Properties of SiO 2 and Si 3 N 4 layers deposited by MF twin magnetron sputtering using different target materials

M. Ruske, Jürgen Pistner, J. Szczyrbowski et al. · Thin Solid Films · 1999 · 13 citations

Natural Sciences, Materials Engineering, Materials Science +15