Low-temperature Si epitaxy on large-grained polycrystalline seed layers by electron–cyclotron resonance chemical vapor deposition - Concepedia

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Low-temperature Si epitaxy on large-grained polycrystalline seed layers by electron–cyclotron resonance chemical vapor deposition

36

Citations

7

References

2004

Year

B. Rau, I. Sieber, Jens Schneider, M. Muske, Michael Stöger‐Pollach, P. Schattschneider, S. Gall, W. Fuhs

Journal of Crystal Growth

Materials ScienceLow-temperature Si EpitaxyEngineeringApplied PhysicsSemiconductor Device FabricationMolecular Beam EpitaxyEpitaxial GrowthChemical Vapor Deposition

References

	Year	Citations

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