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Molecular beam epitaxial growth of InGaAsN:Sb/GaAs quantum wells for long-wavelength semiconductor lasers
179
Citations
16
References
1999
Year
Optical MaterialsEngineeringLaser ApplicationsLaser MaterialHigh-power LasersSemiconductorsSemiconductor LasersSb/gaas Quantum WellsLong-wavelength Semiconductor LasersMolecular Beam EpitaxyEpitaxial GrowthCompound SemiconductorSemiconductor TechnologyPhotonicsPhotoluminescencePhysicsOptoelectronic MaterialsX-ray DiffractionApplied PhysicsIngaasn/gaas QwsOptoelectronics
InGaAsN:Sb/GaAs quantum wells (QWs) were grown by solid-source molecular beam epitaxy using a N2 radio-frequency plasma source. Photoluminescence reveals an enhancement in the optical properties of InGaAsN/GaAs QWs by the introduction of Sb flux during growth. X-ray diffraction and reflection high-energy electron diffraction analyses indicate that Sb acts as a surfactant. This technique was used to improve the performance of long-wavelength InGaAsN laser diodes. A low-threshold current density of 520 A/cm2 was achieved for an InGaAsN:Sb/GaAs single quantum well 1.2 μm laser diode at room temperature under pulsed operation.
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