Publication | Closed Access
Fabrication of an ordered nanoparticle array with a nanoaperture membrane used as a contact-mask
13
Citations
13
References
2005
Year
NanoparticlesEngineeringElectron-beam LithographyNanodevicesNanostructured SurfaceBiomedical EngineeringFeature SizeBeam LithographyNanolithographyNanostructure SynthesisNanometrologyMicrofluidicsAperture SizeNanolithography MethodMaterials ScienceNanotechnologyOrdered Nanoparticle ArrayMicrofabricationNanomaterialsApplied PhysicsNanoreactorNanofabricationNanoaperture Membrane
In this paper, we provide a useful technology to fabricate a long-range ordered nanoparticle array with a feature size under 30 nm. By adjusting the incident angle of Ar+ beam milling on a U-shaped barrier layer of anodic alumina oxide, we can create a long-range ordered nanoaperture array with samples prepared by a focused-ion-beam-guided process. Compared to the naturally self-organized alumina nanochannels, the FIB-guided process has increased long-range ordering and uniformity of aperture size, and the aperture size can be varied by changing the grazing angle. The nanoaperture membrane can be used as a contact-mask and its undercut structure has another advantage for nanolithography. This technique could be extensively applied to the manufacturing of advanced nanodevices in large areas and as a catalyst to fabricate one-dimensional nanosized materials.
| Year | Citations | |
|---|---|---|
Page 1
Page 1