Applied Physics Letters · 2007 · 397 citations · 9 references
EngineeringElectrical EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsIii-v SemiconductorsP-n JunctionsPhotovoltaic DevicesSemiconductor Device MaterialsSemiconductor HeterostructuresSolar CellsHeterojunction Solar CellsHeterojunctionsHeterostructure DevicesJunction EngineeringOpen-circuit VoltageP-n Junction Solar CellsSemiconductor HeterojunctionsSolar Cell Device Physics
The authors demonstrate a thin, Ge-free III–V semiconductor triple-junction solar cell device structure that achieved 33.8%, 30.6%, and 38.9% efficiencies under the standard 1sun global spectrum, space spectrum, and concentrated direct spectrum at 81suns, respectively. The device consists of 1.8eV Ga0.5In0.5P, 1.4eV GaAs, and 1.0eV In0.3Ga0.7As p-n junctions grown monolithically in an inverted configuration on GaAs substrates by organometallic vapor phase epitaxy. The lattice-mismatched In0.3Ga0.7As junction was grown last on a graded GaxIn1−xP buffer. The substrate was removed after the structure was mounted to a structural “handle.” The current-matched, series-connected junctions produced a total open-circuit voltage over 2.95V at 1sun.
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40% efficient metamorphic GaInP∕GaInAs∕Ge multijunction solar cells
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A 27.3% efficient Ga0.5In0.5P/GaAs tandem solar cell
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Solar cell efficiency tables (version 29)
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High rate epitaxial lift-off of InGaP films from GaAs substrates
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