Determination of the band-gap energy of Al1−xInxN grown by metal–organic chemical-vapor deposition

K. S. Kim, A. Saxler, Patrick Kung, M. Razeghi, K. Y. Lim

Applied Physics Letters · 1997 · 120 citations · 11 references

Concepts

Abstract

Ternary AlInN was grown by metal–organic chemical-vapor deposition in the high Al composition regime. The band-gap energy of AlInN ternary was measured by optical absorption spectroscopy at room temperature. The band-gap energy of Al0.92In0.08N is 5.26 eV. The potential application of AlInN as a barrier material for GaN is also discussed.

References

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