Properties of ITO thin films deposited on amorphous and crystalline substrates with e-beam evaporation

R X Wang, C. D. Beling, A B Djuri, S Li, S. Fung

Semiconductor Science and Technology · 2004 · 32 citations · 16 references

Concepts

Abstract

Indium tin oxide (ITO) thin films were deposited using the e-beam evaporation method on amorphous and crystalline substrates under identical conditions. The properties of the films were investigated using optical transmittance, XRD and XPS techniques. It was found that the properties of the films depend strongly on the nature of the substrate surface. Analysis suggests that changes in chemical composition and microstructure of the ITO films deposited on crystalline and amorphous substrates are responsible for the differences in optical properties.

References

16