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Different architectures of relaxed Si1−xGex/Si pseudo-substrates grown by low-pressure chemical vapor deposition: Structural and morphological characteristics

Materials ScienceMaterials EngineeringEngineeringDifferent ArchitecturesSurface ScienceApplied PhysicsRelaxed Si1−xgex/si Pseudo-substratesSemiconductor Device FabricationChemical DepositionMorphological CharacteristicsMicroelectronicsChemical Vapor DepositionSilicon On Insulator