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Chemical contribution of oxygen to silicon carbide plasma etching kinetics in a distributed electron cyclotron resonance (DECR) reactor

Carbide PlasmaChemical EngineeringEngineeringApplied PhysicsPlasma CombustionChemical ContributionHydrogenChemistryGas Discharge PlasmaMicroelectronicsPlasma EtchingChemical KineticsPlasma ProcessingCarbide