Properties of TiN hard coatings prepared by unbalanced magnetron sputtering and cathodic arc deposition using a uni- and bipolar pulsed bias voltage

High Rate Thick Film Growth

John A. Thornton · Annual Review of Materials Science · 1977 · 2.1K citations

Natural Sciences, Materials Engineering, Materials Science +12

Revised structure zone model for thin film physical structure

R. Messier, Anupam Giri, R. Roy · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1984 · 945 citations

Natural Sciences, Materials Science, Physics +12

X-ray diffraction studies of physically vapour-deposited coatings

D.S. Rickerby, A.M. Jones, B. Bellamy · Surface and Coatings Technology · 1989 · 168 citations

Natural Sciences, Materials Engineering, Materials Science +14

Ion-assisted sputtering of TiN films

J. Musil, S. Kadlec, V. Valvoda et al. · Surface and Coatings Technology · 1990 · 88 citations

Natural Sciences, Materials Engineering, Materials Science +12

Improved control of TiN coating properties using cathodic arc evaporation with a pulsed bias

Walter Olbrich, J. Fessmann, G. Kampschulte et al. · Surface and Coatings Technology · 1991 · 83 citations

Natural Sciences, Materials Engineering, Materials Science +14