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Ultra-Low Thermal Conductivity in W/Al <sub>2</sub> O <sub>3</sub> Nanolaminates
349
Citations
16
References
2004
Year
Materials EngineeringMaterials ScienceAluminium NitrideEngineeringPhysicsSurface ScienceApplied PhysicsCondensed Matter PhysicsHigh DensitiesUltra-low Thermal ConductivityThermal ConductionThin FilmsThermal ConductivityChemical Vapor DepositionAtomic Layer DepositionThermal PropertyThermal Properties
Atomic layer deposition and magnetron sputter deposition were used to synthesize thin-film multilayers of W/Al(2)O(3). With individual layers only a few nanometers thick, the high interface density produced a strong impediment to heat transfer, giving rise to a thermal conductivity of approximately 0.6 watts per meter per kelvin. This result suggests that high densities of interfaces between dissimilar materials may provide a route for the production of thermal barriers with ultra-low thermal conductivity.
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