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Er-doped ZnO films grown by pulsed e-beam deposition
32
Citations
26
References
2007
Year
Optical MaterialsEngineeringFused SilicaOptoelectronic DevicesLuminescence PropertySemiconductorsEr-doped Zno FilmsIi-vi SemiconductorEr IonsPulsed Laser DepositionMaterials SciencePhotoluminescenceNanotechnologyOxide ElectronicsOptoelectronic MaterialsGallium OxideApplied PhysicsEr3+ IonsThin FilmsOptoelectronics
Erbium (Er)-doped ZnO thin films were grown on fused silica (SiO2) substrates by pulsed electron-beam deposition (PED) and analysed by Rutherford backscattering spectrometry (RBS), ultraviolet–visible absorption, and photoluminescence (PL). Subsequent annealing at 700 °C produces remarkable effects on the optical properties of Er-doped films. Under 325 nm excitation, a dramatic increase of deep-level emission from 450 to 680 nm was observed from annealed Er-doped ZnO films. Under 488 nm excitation, the PL spectrum of annealed Er-doped ZnO films revealed sharp and well-resolved Stark-splitting peaks in both the green emission of transition and the red emission of transition of Er3+ ions, which suggests that the Er ions have been incorporated inside the crystalline ZnO grains after thermal annealing.
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