Concepedia

Effect of chelating agent on benzotriazole removal during post copper chemical mechanical polishing cleaning

Yingxin Miao, Shengli Wang, Chenwei Wang, Yuling Liu, Mingbin Sun, Yang Chen

Microelectronic Engineering · 2014 · 51 citations · 22 references

DOI

Concepts

References

22

Review on copper chemical–mechanical polishing (CMP) and post-CMP cleaning in ultra large system integrated (ULSI)—An electrochemical perspective

Yair Ein‐Eli, David Starosvetsky · Electrochimica Acta · 2006 · 205 citations

, , +17

Benzotriazole as a volatile corrosion inhibitor during the early stage of copper corrosion under adsorbed thin electrolyte layers

Zhenyu Chen, Ling Huang, Guoan Zhang et al. · Corrosion Science · 2012 · 165 citations

, , +17

Effect of adsorption of some azoles on copper passivation in alkaline medium

Raman Subramanian, V. Lakshminarayanan · Corrosion Science · 2002 · 162 citations

, , +13

Potential-pH Diagrams of Interest to Chemical Mechanical Planarization of Copper

Subramanian Tamilmani, Wayne Huang, Srini Raghavan et al. · Journal of The Electrochemical Society · 2002 · 130 citations

, , +15

Some aspects of copper corrosion in presence of benzotriazole and chloride ions

Snežana Milić, Milan M. Antonijević · Corrosion Science · 2008 · 124 citations

, , +14