Titanium implantation in bulk and thin film amorphous silica

Abstract

Both bulk and thin film amorphous silica implanted with titanium were investigated. We studied the induced modifications of the microstructure and the consequences on the optical properties. We determined the refractive index profile of implanted materials from guided wave measurements and we show that it matches the distribution of titanium. An increase in refractive index of up to 0.9 can be obtained by high dose implantation. A study of thermal annealing in air shows that the implanted materials exhibit low optical losses.